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                    PRODUCT

                    首页 ? Product ? PVD Coating Equipment ? Evaporation Coating Equipment

                    Organic Film Photovoltaic Cell Deposition Equipment
                    编号:SN20151119171200652
                    类别:Evaporation Coating Equipment
                    • 产品概述
                    • 规格参数
                    • 服务支持

                      设备用途   Application

                      适用于制备金属单质薄膜、半导体薄膜、氧化物薄膜、有机薄膜等,可用于科研单位进行新材料、新工艺薄膜研究工作,也可用于大批量生产前的试验工作。

                      Used in prepare metallic single layer film, semiconductor film, oxidant film, organic film etc, can be use in new material, new technique film research as well as experiment pre volume production.

                       

                      设备组成   Structure

                      该设备主要由有机/金属源蒸发沉积室、真空排气系统、真空测量系统、蒸发源、样品加热控温、电控系统、配气系统等部分组成。

                       

                      Consists of organic/metal source evaporation deposition chamber, vacuum pumping system, vacuum measurement system, evaporation source, sample heating temperature control, electric control, gas system etc.

                      主真空室

                      Primary vacuum chamber

                      方型真空室,尺寸400×400×400mm

                      Square vacuum chamber, size 400×400×400mm

                      真空系统配置

                      Vacuum system feature

                      分子泵、机械泵、闸板阀

                      Molecular pump, mechanical pump, gate valve

                      极限压力

                      Ultimate pressure

                      6x10-5Pa

                      恢复真空时间

                      Time required to reacquire vacuum

                      40分钟可达到9x10-4Pa(短时间暴露大气并充入干燥氮气后开始抽气)

                      9x10-4Pa in 40 mins (pumping after short exposure to air and filled with helium)

                      基片加热台

                      Substrate heating table

                      样品尺寸

                      Sample size

                      120×120mm,一片

                      120×120mm, one

                      运动方式

                      Mode of motion

                      基片可上下升降,运动范围050mm

                      Lifting vertically, movement range 0-50mm

                      基片可连续回转,转速530/

                      rotates continuously, rotation speed:5-30 rpm

                      加热

                      Heating

                      基片加热最高温度300℃

                      Max heating temperature 300℃

                      基片到蒸发源距离:250mm300mm

                      Distance between substrate to evaporation source: 250mm300mm

                      有机蒸发源

                      Organic evaporation source

                      坩埚

                      crucible

                      坩埚容量:2cc

                      Crucible capacity: 2cc

                      温度

                      Temperature

                      室温--500,连续可调

                      Room temperature-500℃, continuously adjustable

                      功率

                      Power

                      电流300A,最大输出功率3Kw

                      Current 300A, max output power 3Kw

                      水冷电极

                      Water cooling electrode

                      4根,组成2个蒸发舟

                      4, forming 2 evaporation boat

                      石英晶体膜厚控制仪

                      Quartz crystalline film thickness monitor

                      检测膜厚显示范围:0--99μ9999Àº

                      Film thickness display range: 0--99μ9999Àº

                      占地面积

                      Space occupied

                      主机

                      Main unit

                      2450×1250mm2独立机架(770×600 mm2),尺寸大小同手套箱(1830×750mm2)配合

                      2450×1250mm2 (independent mounting base770×600 mm2, fitting glove box 1830×750mm2)

                      电控柜

                      Electric cabinet

                      700×700mm2(一个)(One)

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