"

泛亚竞猜-首页拥有全球最顶尖的原生APP,每天为您提供千场精彩体育赛事,泛亚竞猜-首页更有真人、彩票、电子老虎机、真人电子竞技游戏等多种娱乐方式选择,泛亚竞猜-首页让您尽享娱乐、赛事投注等,且无后顾之忧!

                    "
                    PRODUCT

                    首页 ? Product ? LED Substrate And Window Sheet Manufacturing Equipment ? Kyropoulos (KY) Sapphire Crystalline Furnace

                    Kyropoulos Method (KY) Sapphire Crystal Growing Furnace
                    编号:SN20151119114012793
                    类别:Kyropoulos (KY) Sapphire Crystalline Furnace
                    • 产品概述
                    • 规格参数
                    • 服务支持

                      设备用途:LED衬底,窗口材料,手机屏,军工领域,智能设备,大规模集成电路SOI SOS等等。

                      Application: LED substrate, window material, cell phone screen, military industry, smart devices, large-scale integrated circuit (LSI), SOI and SOS etc.

                      设备原理:泡生法:在真空环境中,通过电阻加热将三氧化二铝原料熔化,通过籽晶引导,采用精密上称重技术进行微量提拉生长优质光学级蓝宝石单晶。

                      Theory: Kyropoulos method: In vacuum environment, melting aluminum oxide by heating the material with electric resistance, and guide the melting material with seed rod, employ  to pull finely to grow high quality optics level sapphire monocrystal.

                       

                      产品型号: Model:

                      TDR85K-II:生长75 kg85 kg晶体 Grows 75kg-85kg ingot

                      TDR120K:生长100 kg120 kg晶体 Grows 100kg-120kg ingot

                       

                       产品特点:Product feature

                      1、      PLC全自动操作系统  

                      X2技术平台,晶体生长过程(除引晶外)实现全自动化智能操作,生长条件可高度复制;能抗干扰自动调节功率,保证晶体稳定性,实现人机界面控制系统与工艺紧密结合。

                         1, PLC automatic operation system

                      X2 technology platform, fully automated operation on growing process (except seeding), growing condition highly replicable;

                      2、      精密提拉旋转机构

                      2. Precision lifting and rotation mechanism

                      专利设计,控制精度高,传动平稳,抗干扰能力强,利于晶体生长。

                      Patent design, high precision control, smooth transfer, strong anti-interference ability, creates an excellent environment for crystal growing.

                      3、      高稳定性热场

                      High hot zone stability

                      精确的温度曲线控制,先进模拟软件设计,保证原材料纯度,热变形小,使用寿命长。

                      Precise control of temperature curve, advanced design of stimulation software, guarantee of the purity of raw material, minimization of thermal deformation, long working life.

                      4、      高效水冷系统

                      Highly efficient water cooling system

                      先进的设计制造工艺,炉体冷却效果好,震动小。

                      Advanced design and manufacturing process, excellent cooling effect on chamber, low vibration.

                      5、      PAC全自动操作程序

                      PAC fully automated operation program

                      触摸屏操作,人机界面控制系统与工艺紧密结合,可远程控制,信息存储、分析、列表。

                      Operated on touch screen, human-computer interface integrated with technics, be able to perform control, data storage, analyze functions remotely.

                       

                      产品优势:Product advantages:

                      1、  缩短生长周期,比同类产品周期缩短2-3天。

                      Reduce the growing cycle by 2-3 days comparing with other similar products.

                      2、  优异的晶体质量,达到光学等级以上。

                      Produce crystal that achieves optics quality.

                      3、  低能耗

                      Low energy consumption

                      设备及热场稳定性高,重复型号,损耗小,且设备能耗低于同类产品20%以上。

                      High stability on equipment and hot zone, repeated model, low wearing level, and energy consumption is more than 20% lower than other similar products.

                      4、  高取材率

                      High sample drawing rate

                      成熟的设备制造技术和长晶工艺,确保晶体取材率≥70%

                      With our mature manufacturing and crystal growing technology, the sample drawing rate is 70%.

                      5、  研发优势

                      R&D advantages

                      规模化的研发基地,及时进行技术验证及创新,确保产品及技术的成熟性和前沿性。

                      Large scale R&D center enables continuous technical validation and innovation ensures the product and technology is mature and stay cutting-edge.

                      6、  技术培训

                      Skills training

                      拥有研发基地,可验证长晶,为客户提供专业技术培训、设备操作和工艺指导。

                      Own R&D center to test crystal growing, providing our clients with professional training on technique, operation and process.

                      7、  安全性高

                      High safety level

                      配置真空安全保护装置,安全性能更高。

                      Equipped with vacuum safety protection device, increases safety level.

                       

                      性能参数:Specification:

                       

                       

                      TDR85K-II

                      TDR120K

                      炉内真空度

                      Internal vacuum

                      空炉极限真空度

                      Ultimate vacuum (empty chamber)

                      ≤9.0×10-5Pa

                      ≤9.0×10-5Pa

                      长晶阶段真空度

                      Ultimate chamber(growing phase)

                      ≤5.0×10-3Pa

                      ≤5.0×10-3Pa

                      炉体

                      Chamber

                      炉腔内尺寸(直径×高)

                      Internal dimension (diameter×height)

                      680×1030(±2.5mm

                      750×1160(±2.5mm

                      炉盖升降行程

                      Lid lifting stroke

                      上下120mm 旋转180°

                      Vertical 120mm rotate 180°

                      上下120mm 旋转180°

                      Vertical 120mm rotate 180°

                      籽晶杆

                      转速/精度 Revolution/Precision

                      0.1-6rpm±5%

                      1-20rpm±5%

                      提拉速度连续可调范围/精度

                      Adjustable range/precision of pulling speed

                      0.1--4mm/h±2%FS

                      0.05--10mm/h±2%FS

                      快提拉速度连续升降可调

                      Adjustable lifting range of fast pulling speed

                      手动 Manual

                      手动 Manual

                      称重量程精度

                      Weighing range precision

                      0-120kg/±12g

                      0-200kg/±20g

                      氩气

                      Argon

                      压力 Pressure

                      0.6kgf/cm2

                      0.6kgf/cm2

                      用量 Usage

                      0.5m3/每炉次

                      0.7m3/每炉次

                      冷却水

                      Cooling water

                      入口压力 inlet pressure

                      2.0±0.5kg/cm2

                      2.0±0.5kg/cm2

                      流量 Flux

                      最大12m3/h

                      最大14m3/h

                      电源 Power

                      功率Power

                      135KW

                      140KW

                      自动控制系统 Automated control system

                      PLC全自动运行程序 PLC automatic operation program

                      设备占地面积 Space occupied

                      (长×宽×高)2240×1130×3020mm3

                      (L×W×H)

                       

                       

                    留言咨询 (* 为必填项目)
                    * 姓名
                    * 内容
                    * 验证码
                    ?
                    泛亚竞猜-首页