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                    PRODUCT

                    首页 ? Product ? CVD Coating Equipment ? PECVD Plasma Enhanced Chemical Vapor Deposition Equipment Series

                    PECVD Plasma Enhanced Chemical Vapor Deposition
                    编号:SN20151119105807700
                    类别:PECVD Plasma Enhanced Chemical Vapor Deposition Equipment Series
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                      Applications

                      The device uses a plasma enhanced chemical vapor deposition techniques, the deposition of silicon nitride material on different substrates of optical glass, silicon, quartz and stainless steel, a thin film of amorphous silicon and microcrystalline silicon for the preparation of amorphous and microcrystalline silicon thin film solar cell devices. It can be widely used in universities, research institutes and small batch preparation of thin film materials.

                      structure

                       

                      The multi-chamber CVD sheet structure consisting of two in and out of the room, three independent PECVD reaction chamber structure is connected by a straight line, the workpiece transported through the transmission mechanism to the respective vacuum chamber process, between the vacuum chamber is connected with the gate valve. The system consists of a vacuum chamber, vacuum acquisition system, RF and VHF power supply, consisting of a substrate heating temperature control system, air circuit systems, exhaust gas treatment systems, transmission and other parts.

                        Technical Data

                      model

                       

                      vacuum chamber

                      quantity3dimensions: 400×400×300mmboostrate≤0.67Pa/h

                      in/out sample chamber

                      in/out sample chamber quantity 2个;measurement: 400×300×300mm

                      vacuum system configuration

                      vacuum chamber

                      molecular pumpdirect connection mechanical pumproots pumpCF-200 pneumatic gate valve digital readout vacuum measurement gaugethin film gauge3 deflation valve1 import system pressure APC closed cycle butterfly valve

                      in/out sample chamber

                      share 1 roots pump1 mechanical pump1 digital readout vacuum gauge1 deflation valve

                      ultimate pressure

                      vacuum chamber

                      ≤1.0x10-5 Pa

                      in/out sample chamber

                      ≤1.0×10-1Pa

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