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                    PRODUCT

                    首页 ? Product ? CVD Coating Equipment ? Hard Carbon Film Deposition Equipment

                    FHL-600 High Vacuum Hard Carbon Film Preparation System
                    编号:SN20151119103459277
                    类别:Hard Carbon Film Deposition Equipment
                    • 产品概述
                    • 规格参数
                    • 服务支持

                      Application(用途):

                          It is a vertical structure, high vacuum single chamber film coating equipment. Used for developing single layer film that is the diamond- like carbon film (DLC). DLC film has high infrared spectrum transmittance, high hardness, low friction coefficient and good chemical stability, can be used for antireflection film and protective film of various optical materials which plays anti-fraying, anticorrosion, anti-deliquescence and anti-oxidation effect, and suitable for mass production of  infrared lens optical manufacturers.

                       

                      Structure(组成)

                       

                      Film coating chamber, target electrode, RF power, solenoid coil, control power supply (CPS), vacuum pumping system, vacuum measurement system, electrical control system, gas circuit system and water circuit system.

                      Specification(技术指标)

                      Type

                      FHL-600

                      Sputtering Vacuum Chamber

                      cylindrical, size: Ф600×400mm

                      Limited Vacuum of Sputtering Vacuum Chamber

                      5×10-4 Pa (after baking and degasing)

                      Regain Vacuum Time

                      3×10-3Pa after40 min. (pumping after short-time exposed to air and filled with nitrogen)

                      Target Electrode and Upper Electrode Plate

                      To install a target electrode and placed a sample which size isФ251mm on top of it at the coating film chamber chassis.

                      To install a set of upper electrode plate on the cover, it forms a plate capacitor with the target electrode which distance adjustable continuously.

                      Electrical Control System

                      RF power, excitation power, and main power

                      Gas Circuit System

                      three-way Mass Flow Controller (MFC)

                      Floor Occupied

                      Main Set

                      1200×1150mm2

                      Electrical Cabinet

                      700×700mm2(two sets)

                       

                       

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