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                    PRODUCT

                    首页 ? Product ? CVD Coating Equipment ? MOCVD Deposition Equipment

                    MOCVD coating equipment
                    编号:SN20151119102507556
                    类别:MOCVD Deposition Equipment
                    • 产品概述
                    • 规格参数
                    • 服务支持

                      Application
                      Mainly used in compound semiconductor materials research and production of semiconductor optoelectronic devices and the primary method of microwave device materials for the world's production, preparation, such as lasers, light emitting diodes, high efficiency solar cells, photoelectric cathode, etc. optoelectronics and other industries is indispensable equipment.
                      Structure
                      a reaction chamber,
                      sample introduction chamber, sample transfer mechanism, gas path systems, electronic control systems, computer systems and other components.

                      Technical Data

                      vacuum chamber 

                      reaction chamber size Ф200×240mm sample introduction chamber sizeФ300×240mm

                      ultimate vacuum

                      reaction chamber≤6.7×10-5Pasample introduction chamber≤6.7×10-4Pa

                      deposition temperature

                      8001200

                      temperature accuracy

                      ±1

                      Loading slice ability

                      2"4",1-6slice

                      Process pressure range

                      13.3266Pa

                      gas path system

                      using 3-5 path metal organic source; 4-6 gas source

                      floor occupied

                      main set

                      1200×1000mm2

                      gas control cabinet

                      1300×600mm2

                      electronic control cabinet

                      700×700mm22

                       

                       

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